Document Type : Reseach Article
Authors
- Mohd Syahrin Amri Bin Mohd Noh 1
- Ghazali Bin Omar 2
- Mohd Syafiq Bin Mispan 3
- Fuaida Binti Harun 4
- Zaleha Binti Mustafa 5
1 Centre for Advance Research on Energy, Universiti Teknikal Malaysia Melaka, Hang Tuah Jaya 76100 Durian Tunggal, Melaka, Malaysia.
2 Faculty of Mechanical Technology and Engineering, Universiti Teknikal Malaysia Melaka
3 Faculty of Electronics and Computer Technology and Engineering, Universiti Teknikal Malaysia Melaka.
4 Infineon Technologies (M) Sdn. Bhd,
5 Faculty of Industrial and Manufacturing Technology and Engineering, Universiti Teknikal Malaysia Melaka,
Abstract
Silicon wafers have been widely used in semiconductor manufacturing, and chipping issues often highlighted during wafer dicing which affects device performance and reliability. The phenomenon of chipping has been observed to have detrimental effects on die strength, leading to the potential of crack formation. Cracks became a major concern because its sometimes undetected during testing and had been reported to cause malfunctions at user applications. This study aims to comprehensively analyze the fragile behavior of silicon concerning its chipping and flexural strength performance, providing valuable insights for engineering applications. The research employed new wafer mounting techniques, including chipping analysis, a three-point bending test and scanning electron microscopy (SEM) to reduce silicon die chipping and increase the flexural strength by evaluating the novel semi and full sandwich wafer mounting techniques. The study demonstrated that the implementation of novel full sandwich mounting technique had improved significantly the silicon die chipping and flexural die performance among all the wafer mounting techniques.
Keywords
- J Lindroos, A. Lehto, T. Motooka, and M. Tilli, “Handbook of Silicon Based MEMS Materials and Technologies”. 2010.
- G. Croissant, K. S. Butler, J. I. Zink, and C. J. Brinker, “Synthetic amorphous silica nanoparticles: toxicity, biomedical and environmental implications,” Nat. Rev. Mater., vol. 5, no. 12, pp. 886–909, 2020, doi: 10.1038/s41578-020-0230-0.
- Paulasto-Kroâckel, M. Tilli, G. Ross, and H. Kuisma, “Where is silicon based MEMS heading to? Handbook of Silicon Based MEMS Materials and Technologies”. pp. xxi–xxix, 2020, doi: 10.1016/B978-0-12-817786-0.00062-1.
- Control and C. July, “Surface Position Detection Method of Silicon Melt in CZ Furnace,” pp. 5021–5026, 2016.
- Zhao, X. Zhao, M. Roders, A. Gumyusenge, A. L. Ayzner, and J. Mei, “Melt-Processing of Complementary Semiconducting Polymer Blends for High Performance Organic Transistors,” Adv. Mater., vol. 29, no. 6, pp. 1–7, 2017, doi: 10.1002/adma.201605056.
- Inoue et al., “Morphological characterization and mechanical behavior by dicing and thinning on direct bonded Si wafer,” J. Manuf. Process., vol. 58, no. January, pp. 811–818, 2020, doi: 10.1016/j.jmapro.2020.08.050.
- Inoue et al., “Influence of Si wafer thinning processes on (sub)surface defects,” Appl. Surf. Sci., vol. 404, pp. 82–87, 2017, doi: 10.1016/j.apsusc.2017.01.259.
- Shen, X. Zhu, J. Chen, P. Tao, and X. Wu, “Investigation on the edge chipping in ultrasonic assisted sawing of monocrystalline silicon,” Micromachines,” vol. 10, no. 9, 2019, doi: 10.3390/mi10090616.
- Takyu et al., “A Novel Dicing Technologies for WLCSP Using Stealth Dicing through Dicing Tape and Back Side Protection-Film,” Proc. - Electron. Components Technol. Conf., vol. 2016-Augus, pp. 1241–1246, 2016, doi: 10.1109/ECTC.2016.138.
- Xue, C. Zhong, E. Zhang, W. Jiang, and C. Zhang, “Die chipping FDC development at wafer saw process,” 2021 22nd Int. Conf. Electron. Packag. Technol. ICEPT 2021, 2021, doi: 10.1109/ICEPT52650.2021.9568039.
- Xue, T. Chen, X. Zhang, L. Gao, and M. Li, “Effect of Blade dicing parameters on Die Strength,” Proc. - 2018 19th Int. Conf. Electron. Packag. Technol. ICEPT 2018, pp. 180–183, 2018, doi: 10.1109/ICEPT.2018.8480532.
- Zhang, W. F. Wang, and P. Y. Huang, “Optimization of Wafer Dicing-Saw to Reduce the Chipping Defect by Using the Response Surface Methodology,” 2022 China Semicond. Technol. Int. Conf. CSTIC 2022, pp. 24–27, 2022, doi: 10.1109/CSTIC55103.2022.9856868.
- J. Su, Y. F. Chen, J. C. Cheng, and C. L. Chiu, “An artificial neural network approach for wafer dicing saw quality prediction,” Microelectronics Reliability, vol. 91. pp. 257–261, 2018, doi: 10.1016/j.microrel.2018.10.013.
- J. Kim, “Development of waxless wafer mounting system for silicon wafer polishing process,” Appl. Mech. Mater., vol. 339, pp. 762–765, 2013, doi: 10.4028/www.scientific.net/AMM.339.762.
- K. Bin Zainal, A. Bin Abdul Aziz, and V. Ramalingam, “Backside Chipping Investigation & Improvement on TiNiVAg Back Metal Silicon Die,” Proc. IEEE/CPMT Int. Electron. Manuf. Technol. Symp., vol. 2022-Octob, pp. 0–3, 2022, doi: 10.1109/IEMT55343.2022.9969494.
- A. Mendoza, A. G. S. Gablan, H. L. Tierra, and F. R. I. Gomez, “Process Simplification on Integration of UV Cure Machine with Tape Saw Singulation,” J. Eng. Res. Reports, vol. 20, no. 10, pp. 1–5, 2021, doi: 10.9734/jerr/2021/v20i1017382.
- P. Orlando, J. L. Goodrich, and E. L. Gosselin, “Backside Mounting Procedures for Semiconductor Wafer Processing,” 2001.
- S. Premachandran et al., “Wafer level high temperature reliability study by backside probing f or a 50um thin TSV wafer,” Proc. - Electron. Components Technol. Conf., vol. 2015-July, pp. 2144–2148, 2015, doi: 10.1109/ECTC.2015.7159899.
- C. S. Bacquian, “Dicing before Grinding : A Robust Wafer Thinning and Dicing Technology,” vol. 11, no. 4, pp. 25–34, 2020, doi: 10.9734/JERR/2020/v11i417067.
- Fabiana Meijon Fadul, “Analysis of Crystalline in GaN Epitaxial Layer after the Wafer Dicing Process,” vol. 1593, pp. 1–6, 2019.
- Sekhar et al., “Mechanical strength problem of thin silicon wafers (120 and 140 μm) cut with thinner diamond wires (Si kerf 120 → 100 μm) for photovoltaic use,” Materials Science in Semiconductor Processing, vol. 119. 2020, doi: 10.1016/j.mssp.2020.105209.
- Liu, T. Yang, X. Tian, S. Chen, F. Dong, and J. Han, “Iterative method for obtaining nonuniform grinding-induced residual stress distribution of silicon wafers based on global deformation,” Mater. Sci. Semicond. Process., vol. 150, no. July, p. 106971, 2022, doi: 10.1016/j.mssp.2022.106971.
- M. Chang and H. M. Ler, “Effect of Wafer Back Metal Thickness and Surface Roughness towards Backend Assembly Processes,” Proc. IEEE/CPMT Int. Electron. Manuf. Technol. Symp., vol. 2022-Octob, 2022, doi: 10.1109/IEMT55343.2022.9969478.
- Sekhar, T. Fukuda, K. Tanahashi, and H. Takato, “The impact of silicon brick polishing on thin (120 μm) silicon wafer sawing yields and fracture strengths in diamond-wire sawing,” Mater. Sci. Semicond. Process., vol. 105, no. September 2019, p. 104751, 2020, doi: 10.1016/j.mssp.2019.104751.
- Wu, F. Ren, and H. Ma, “The effect of surface morphology on the peel performance of UV-induced adhesion-reducing adhesives The effect of surface morphology on the peel performance of UV- induced adhesion-reducing adhesives,” 2022.
- Liu, Y. Wei, J. Wang, and S. Xu, “Investigation of single cut process in mechanical dicing for thick metal wafer,” 2016 17th Int. Conf. Electron. Packag. Technol. ICEPT 2016, pp. 26–30, 2016, doi: 10.1109/ICEPT.2016.7583083.
- Gao, R. Kang, Z. Dong, and B. Zhang, “Edge chipping of silicon wafers in diamond grinding,” International Journal of Machine Tools and Manufacture, vol. 64. pp. 31–37, 2013, doi: 10.1016/j.ijmachtools.2012.08.002.
- Y. Tsai and P. S. Huang, “Correction factors to strength of thin silicon die in three- and four-point bending tests due to nonlinear effects,” Microelectron. Reliab., vol. 128, no. September 2021, p. 114424, 2022, doi: 10.1016/j.microrel.2021.114424.
- Talledo, “Comparison of Silicon Die Strength Using Different Loading Anvil Shapes,” J. Eng. Res. Reports, vol. 20, no. 6, pp. 17–23, 2021, doi: 10.9734/jerr/2021/v20i617323.
- Talledo, “Effect of Silicon Die Condition on the Breaking Load Performance of a Dam and Fill Semiconductor Package,” J. Eng. Res. Reports, vol. 20, no. 6, pp. 64–69, 2021, doi: 10.9734/jerr/2021/v20i617328.
- E. Nikitin et al., “Fracture strength of silicon solar wafers with different surface textures,” Mater. Sci. Semicond. Process., vol. 140, no. November 2021, p. 106386, 2022, doi: 10.1016/j.mssp.2021.106386.
- N. Li, T. B. Yu, L. Da Zhu, and W. S. Wang, “Analytical modeling of ground surface topography in monocrystalline silicon grinding considering the ductile-regime effect,” Arch. Civ. Mech. Eng., vol. 17, no. 4, pp. 880–893, 2017, doi: 10.1016/j.acme.2017.03.010.